Основной контент книги Silicon Technologies. Ion Implantation and Thermal Treatment
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Volume 357 pages
Silicon Technologies. Ion Implantation and Thermal Treatment
author
annie baudrant
$198
About the book
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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Age restriction:
0+Release date on Litres:
10 April 2018Volume:
357 p. ISBN:
9781118601112Total size:
14 МБTotal number of pages:
357Copyright holder:
John Wiley & Sons Limited