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Основной контент книги Atomic Layer Deposition
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Book duration 274 pages

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Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications
Читайте только на Литрес

The book cannot be downloaded as a file, but can be read in our app or online on the website.

$250.67

About the book

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Book David Cameron, Arthur Sherman «Atomic Layer Deposition» — read online on the website. Leave comments and reviews, vote for your favorites.
Age restriction:
0+
Release date on Litres:
02 October 2018
Volume:
274 p.
ISBN:
9781118747421
Total size:
3.3 МБ
Total number of pages:
274
Publisher:
Copyright holder:
John Wiley & Sons Limited
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